Replication molds having nanometer-scale shape control fabricated by means of oxidation and etching

February 4, 2002

Replication  molds having nanometer-scale shape control fabricated by means of oxidation  and etching

 

G. M. Kim, A. Kovalgin, J. Holleman, and J. Brugger

J. Nanosci.  Nanotech. 2002, Vol. 2, No. 1

 

Accurate control of the curvature radius of  molds that are used in nanostructure replication techniques is presented. The  local non-uniform growth of SiO2at regions with high curvature is  used to fabricate molds with curvature radius ranging anywhere between 10 and  250 nm. The mold radius is predicted by numerical simulation as function of  oxidation temperature and time, and confirmed by a series of oxidation and  etching experiments. The silicon, silicon dioxide and polymer nanostructures  are analysed by scanning electron microscopy and compared to the theory.  Replication into photo-plastic polymer from various sharp and round molds is  performed and their properties are discussed. Our results are useful for  designing nanostructures in the area of soft-lithography and nanoprobe  engineering.

 

 

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